Puriens semiconductor brush core product

About this video

In the semiconductor industry, where impurities are unacceptable, addressing contamination defects that occur after the CMP (Chemical Mechanical Planarization) process is critical for improving yield. At the heart of this solution is the high-performance PURIENCE PVA brush. We have created a 3D visualization that centers around the brush and core, featuring a comprehensive setup that includes a wafer, rollers, and chemical elements.

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